| 出版年月 |
著作類別 |
著作名稱 |
作者 |
收錄出處 |
| 2021-08 |
期刊論文
|
Homeotropic liquid crystal alignments through periodically unidirectional nano-wedges patterned by nanoimprint lithography |
C.R. Sheu, T.J. Wang, and C.H. Lin* |
Micro and Nano Engineering
|
| 2021-01 |
期刊論文
|
Direct synthesis of monolayer gold nanoparticles on epoxy based photoresist by photoreduction and application to surface-enhanced Raman sensing |
Y.J. Chen, W.H. Chang, C.Y. Li, Y.C. Chiu, C.C. Huang, and C.H. Lin* |
Materials and Design
|
| 2021-01 |
期刊論文
|
Selective Growth of Patterned Monolayer Gold Nanoparticles on SU-8 through Photoreduction for Plasmonic Applications |
Y.J. Chen, W.H. Chang, and C.H. Lin* |
ACS Applied Nano Materials
|
| 2020-04 |
期刊論文
|
Plasmonic nanocavities fabricated by directed self-assembly lithography and nanotransfer printing and used as surface-enhanced Raman scattering substrates |
C.W. Lin, S.H. Chang, C.C. Huang, and C.H. Lin* |
Microelectronic Engineering
|
| 2019-06 |
期刊論文
|
Quantifying Cell Confluency by Plasmonic Nanodot Arrays to Achieve Cultivating Consistency |
W.H. Chang*, Z.Y. Yang, T.W. Chong, Y.Y. Liu, H.W. Pan, and C.H. Lin* |
ACS Sensors
|
| 2017-01 |
期刊論文
|
A comparative study of inelastic scattering models at energy levels ranging from 0.5 keV to 10 keV |
C.Y. Hu and C.H. Lin* |
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
|
| 2016-04 |
期刊論文
|
Nanotransfer printing of plasmonic nano-pleat arrays with ultra-reduced nanocavity width using perfluoropolyether molds |
C.C. Liang, W.H. Chang, C.H. Lin* |
Journal of Materials Chemistry C
|
| 2015-07 |
研討會論文
|
Broadband Plasmonic Wave Plate Based on Bi-layer Nanorod Array |
Y.R. Huang, C.H. Lin*, and C.C. Liang |
|
| 2015-07 |
研討會論文
|
Cell growth detection using a localized surface plasmon resonance sensor |
T.W. Chong, W.H. Chang*, C.C. Liang, and C.H. Lin* |
|
| 2015-07 |
研討會論文
|
Fabrication of free-standing gold nanoslits by nano-transfer printing |
C.C. Liang and C.H. Lin |
|
| 2015-07 |
研討會論文
|
High performance phase-based refractive index sensing using anisotropic periodic nanopatch arrays |
Y.T. Yang, C.H. Lin*, W.Y. Chen |
|
| 2015-06 |
期刊論文
|
Reverse ray tracing for transformation optics |
C.Y. Hu and C.H. Lin* |
Optics Express
|
| 2015-03 |
期刊論文
|
Nanoimprinting of Flexible Polycarbonate Sheets with a Flexible Polymer Mold and Application to Superhydrophobic Surfaces |
C.C. Liang, C.H. Lin*, T.C. Cheng, J. Shieh, H.H. Li |
Advanced Materials Interfaces
|
| 2014-07 |
期刊論文
|
Solid immersion interference lithography with conformable phase mask |
C.H. Lin*, Y.C. Lin, C.C. Liang |
Microelectron. Eng.
|
| 2014-02 |
期刊論文
|
Decreasing reflection through the mutually positive effects of nanograss and nanopillars |
C.H. Lin, J. Shieh*, C.C. Liang, C.C. Cheng, and Y.C. Chen |
Journal of Materials Chemistry
|
| 2013-09 |
研討會論文
|
Free-standing transmission grating for EUV interference lithography |
C.H. Lin*, Y.R. Lin, S.H. Chen, Y.Y. Lee, H.S. Fung, B.Y. Shew, and Y.T. Huang, |
|
| 2013-09 |
研討會論文
|
Nanoimprint of flexible polycarbonate sheet with flexible polymer mold |
C.C. Liang, T.C. Cheng, C.H. Lin*, and H.H. Lin |
|
| 2013-08 |
研討會論文
|
Plasmonic phase retardation in anisotropic nanodots: Modeling and increased sensor figure of merit |
W.Y. Chen, C.H. Lin* and W.T. Chen |
|
| 2013-07 |
期刊論文
|
Plasmonic phase transition and phase retardation: Essential optical characteristics of localized surface plasmon resonance |
W.Y. Chen, C.H. Lin* and W.T. Chen |
Nanoscale
|
| 2012-09 |
期刊論文
|
Off-plane diffraction of extreme ultraviolet light caused by line width roughness |
W.Y. Chen and C.H. Lin* |
Thin Solid Films
|
| 2012-09 |
研討會論文
|
Using nanoimprint lithography to realize periodic nano-wedges for liquid crystal alignment with a pretilt angle |
C.R. Sheu., T.J. Wang, and C.H. Lin* |
|
| 2012-07 |
期刊論文
|
Extreme UV diffraction grating fabricated by nanoimprint lithography |
C.H. Lin*, Y.M. Lin, C.C. Liang, Y.Y. Lee, H.S. Fung, B.Y. Shew, and S.H. Chen |
Microelectron. Eng.
|
| 2012-07 |
研討會論文
|
Solid immersion interference lithography with conformable phase mask |
C.H. Lin*, Y.C. Lin and C.C. Liang |
|
| 2011-09 |
研討會論文
|
Bilayer extreme UV diffraction grating fabricated by nanoimprint lithography |
C.H. Lin*, Y. M. Lin, C.C. Liang, Y.Y. Lee, H.S. Fung, B.Y. Shew, and S.H. Chen |
|
| 2011-09 |
研討會論文
|
Estimation of Electric Fields at Bow-tie Antenna Gaps |
W.Y. Chen and C.H. Lin* |
|
| 2011-09 |
研討會論文
|
The optical responses of gold pillar arrays fabricated by direct nanoimprinting of gold nanoparticles |
C.C. Liang, M.Y. Liao, T.C. Cheng, W.H. Chang, and C.H. Lin* |
|
| 2011-08 |
期刊論文
|
Direct imprinting on a polycarbonate substrate with a compressed air press for polarizer applications |
C.H. Lin*, H.H. Lin, W.Y. Chen, and T.C. Cheng |
Microelectron. Eng.
|
| 2011-08 |
期刊論文
|
EUV interferometric lithography and structural characterization of an EUV diffraction grating with nondestructive spectroscopic ellipsometry |
C.H. Lin*, C.H. Fong, Y.M. Lin, Y.Y. Lee, H.S. Fung, B.Y. Shew, and J. Shieh |
Microelectron. Eng.
|
| 2011-02 |
期刊論文
|
Plasmonic metallic nanostructures by direct nanoimprinting of gold nanoparticles |
C.C. Liang, M.Y. Liao, W.Y. Chen, T.C. Cheng, W.H. Chang, and C.H. Lin* |
Optics Express
|
| 2010-11 |
期刊論文
|
Design of Artificial Hollow Moth-Eye Structures Using Anodic Nanocones for High-Performance Optics |
C.T. Wu, C.H. Lin, C. Cheng, C.S. Wu, H.C. Ting, F.C. Chang, and F.H Ko* |
Chemistry of Materials
|
| 2010-09 |
研討會論文
|
Direct imprinting on polycarbonate substrate for polarizer application |
H.H. Lin, W.Y. Chen, and C.H. Lin* |
|
| 2010-09 |
研討會論文
|
Metallic dot array fabricated by direct nanoimprint of metallic nanoparticles |
C.C. Liang, M.Y. Liao , W.Y. Chen, T.C. Cheng, W.H. Chang, and C.H. Lin* |
|
| 2010-09 |
研討會論文
|
Structure characterization of EUV diffraction grating with nondestructive spectroscopic ellipsometry |
C.H. Fong, Y.M. Lin, H.S. Fung, B.Y. Shew, J. Shieh, and C.H. Lin* |
|
| 2010-06 |
期刊論文
|
A standing-wave interpretation of plasmon resonance excitation in split-ring resonators |
W.Y. Chen, C.H. Lin* |
Optics Express
|
| 2010-06 |
研討會論文
|
An Overview of EUVL Related R&D in Taiwan |
(invited panelist) C.H. Lin* |
|
| 2010-06 |
研討會論文
|
Monte Carlo study of inelastic scattering models of low energy electrons |
C.Y. Hu, C.H. Lin*, S.J. Lin., and J.H. Chen |
|
| 2010-05 |
期刊論文
|
Exploiting optical properties of P3HT:PCBM films for organic solar cells with semitransparent anode |
W.H. Lee, S.Y. Chuang, H.L. Chen*, W.F. Su, and C.H. Lin |
Thin Solid Films
|
| 2010-04 |
期刊論文
|
Spatially band-tunable color-cone lasing emission in a dye-doped cholesteric liquid crystal with a photoisomerizable chiral dopant |
C.R. Lee*, S.H. Lin, H.S. Ku, J.H. Liu, P.C. Yang, C.Y. Huang, H.C. Yeh, T.D. Ji, and C.H. Lin |
Optics Letters
|
| 2010-03 |
期刊論文
|
Nanoscale of biomimetic moth eye structures exhibiting inverse polarization phenomena at the Brewster angle |
S.Y. Chuang, H.L. Chen*, J. Shieh, C.H. Lin, C.C Cheng, H.W. Liu, and C.C. Yu |
Nanoscale
|
| 2009-09 |
研討會論文
|
Optical activity in C-shaped metallic array |
W.Y. Chen and C.H. Lin*, and F.H. Ko |
|
| 2009-09 |
研討會論文
|
Silicon substrate with hydrophilic differences affects cell proliferation and adhesion |
W.F. Fong, W.H. Chang, J. Shieh, F.H. Ko, and C.H. Lin* |
|
| 2009-09 |
研討會論文
|
The substrate topography effect in electron beam lithography by Monte Carlo simulation |
C.Y. Hu and C.H. Lin* |
|
| 2009-02 |
期刊論文
|
A new organic/inorganic electroluminescent material with a silsesquioxane core |
C.C. Cheng, C.H. Chien, Y.C. Yen, Y.S. Ye, F.H. Ko, C.H. Lin, and F.C. Chang* |
Acta Materialia
|
| 2008-09 |
期刊論文
|
Using direct nanoimprinting of ferroelectric films to prepare devices exhibiting bi-directionally tunable surface plasmon resonances |
H.L. Chen, K.C. Hsieh, C.H. Lin, and S.H. Chen |
Nanotechnology
|
| 2007-10 |
期刊論文
|
Using colloidal lithography to fabricate and optimize sub-wavelength pyramidal and honeycomb structures in solar cells |
H.L. Chen, S.Y. Chuang, C.H. Lin, and Y.H. Lin |
Optics Express
|
| 2007-06 |
期刊論文
|
Influence of the mask magnification on lithographic imaging in hyper NA lithography |
C.H. Lin*, H.L. Chen, and F.H. Ko |
J. Opt. Soc. Am. A
|
| 2007-05 |
期刊論文
|
Rigorous electromagnetic simulation of mask magnification effects on the diffracted light for EUV binary mask |
C.H. Lin*, H.L. Chen, and F.H. Ko |
Microelectron. Eng.
|
| 2007-04 |
期刊論文
|
Plasma nanofabrications and antireflection applications |
J. Shieh, C.H. Lin, M.C. Yang |
Phys. D: Appl. Phys.
|
| 2007-04 |
期刊論文
|
Self-Organized Tantalum Oxide Nanopyramidal Arrays for Antireflective Structure |
C.T. Wu, and F.H. Ko*, and C.H. Lin |
Appl. Phys. Lett.
|
| 2007-03 |
期刊論文
|
Effect of Intermolecular Hydrogen Bonding on Low-Surface-Energy Material of Poly(vinyl phenol) |
H.C. Lin, C.F. Wang, P.H. Tung, S.W. Kuo, C.H. Lin, and F.C. Chang* |
J. Phys. Chem. B
|
| 2007-01 |
期刊論文
|
H.L. Chen*, K.T. Huang, C.H. Lin, W.Y. Wang, and Wonder Fan |
Fabrication of sub-wavelength antireflective structures in solar cells by utilizing modified illumination and defocus techniques in optical lithography |
Microelectron. Eng.
|
| 2006-04 |
期刊論文
|
Optical characterization of two-dimensional photonic crystals based on spectroscopic ellipsometry with rigorous coupled-wave analysis |
C.H. Lin*, H.L. Chen, W.C. Chao, C.I. Hsieh, and W.H. Chang |
Microelectronic Engineering
|
| 2005-11 |
期刊論文
|
Simulation of air bubble scattering effects in 193 nm immersion interferometric lithography |
C. H. Lin and L. A. Wang |
J. Vac. Sci. Technol. B
|
| 2005-05 |
期刊論文
|
Pair-Correlation Effect and Virial Theorem in the Self-Consistent Density-Functional Theory |
J. Y. Hsu, C. H. Lin, and C. Y. Cheng |
Physical Review A
|
| 2004-03 |
研討會論文
|
Two threshold resist models for optical proximity correction |
W.C. Huang, C.H. Lin, C.C. Kuo, C.C. Huang, J. F. Lin, J.H. Chen, R.G. Liu, Y.C. Ku, Burn J. Lin |
|
| 2001-11 |
期刊論文
|
Feasibility of utilizing hexamethyldisiloxane film as a bottom antireflective coating for 157 nm lithography |
C. H. Lin and L. A. Wang |
J. Vac. Sci. Technol. B
|
| 2001-09 |
期刊論文
|
A study on adhesion and footing issues of HMDSO films as bottom antireflective coating for deep UV lithographies |
C.H. Lin , H.L. Chen , L.A. Wang |
Microelectronic Engineering
|
| 2000-11 |
期刊論文
|
Optimized bilayer hexamethyldisiloxane film as bottom antireflective coating for both KrF and ArF lithographies |
C. H. Lin, L. A. Wang, and H. L. Chen |
J. Vac. Sci. Technol. B
|
| 1999-05 |
期刊論文
|
Fabrication of Sub-Quarter-Micron Grating Patterns by Employing DUV Holographic Lithography |
L. A. Wang, C. H. Lin and J. H. Chen |
Microelectronic Engineering
|
主要學歷